LR

L. Rafael Reif

MIT: 5 patents #953 of 9,367Top 15%
📍 Brookline, MA: #801 of 3,196 inventorsTop 30%
🗺 Massachusetts: #23,459 of 88,656 inventorsTop 30%
Overall (All Time): #1,062,414 of 4,157,543Top 30%
5
Patents All Time

Issued Patents All Time

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
4957777 Very low pressure chemical vapor deposition process for deposition of titanium silicide films Vida Ilderem, Prabha K. Tedrow 1990-09-18
4773355 Growth of epitaxial films by chemical vapor deposition Clifton G. Fonstad, Jr. 1988-09-27
4668530 Low pressure chemical vapor deposition of refractory metal silicides Prabha K. Tedrow, Vida Ilderem 1987-05-26
4659401 Growth of epitaxial films by plasma enchanced chemical vapor deposition (PE-CVD) Clifton G. Fonstad, Jr. 1987-04-21
4579609 Growth of epitaxial films by chemical vapor deposition utilizing a surface cleaning step immediately before deposition Thomas J. Donahue, Wayne R. Burger 1986-04-01