Issued Patents All Time
Showing 26–32 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5595861 | Method of selecting and applying a top antireflective coating of a partially fluorinated compound | — | 1997-01-21 |
| 5587267 | Method of forming photoresist film exhibiting uniform reflectivity through electrostatic deposition | — | 1996-12-24 |
| 5554486 | Techniques for uniformizing photoresist thickness and critical dimension of underlying features through aerosol application of photoresist | — | 1996-09-10 |
| 5549934 | Process of curing hydrogen silsesquioxane coating to form silicon oxide layer | Keith K. Chao | 1996-08-27 |
| 5543265 | Photoresist solution capable of being applied as an aerosol containing 3 to 12 percent by weight solvent | — | 1996-08-06 |
| 5456952 | Process of curing hydrogen silsesquioxane coating to form silicon oxide layer | Keith K. Chao | 1995-10-10 |
| 5330883 | Techniques for uniformizing photoresist thickness and critical dimension of underlying features | — | 1994-07-19 |