Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12368042 | Precursors and processes for deposition of Si-containing films using ALD at temperature of 550° C. or higher | Naoto NODA, Naohisa NAKAGAWA, Jean-Marc Girard, Zhiwen Wan | 2025-07-22 |