LG

Lingyi Guo

KL Kla: 1 patents #347 of 758Top 50%
S( Semiconductor Manufacturing International (Beijing): 1 patents #301 of 689Top 45%
S( Semiconductor Manufacturing International (Shanghai): 1 patents #561 of 1,122Top 50%
SC Shanghai Ic R&D Center Co.: 1 patents #28 of 75Top 40%
Overall (All Time): #1,328,533 of 4,157,543Top 35%
3
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12288725 Critical dimension error analysis method Xueru YU, Hongxia SUN, Chen Li, Pengfei Wang, Jiebin Duan +6 more 2025-04-29
11874102 Thick photo resist layer metrology target Jincheng Pei 2024-01-16
10545402 Overlay compensation method and system thereof Yi Lin 2020-01-28