NS

Norikatsu Sasao

Kioxia: 11 patents #90 of 1,813Top 5%
Toshiba Memory: 6 patents #309 of 1,971Top 20%
KT Kabushiki Kaisha Toshiba: 5 patents #5,683 of 21,451Top 30%
Overall (All Time): #188,304 of 4,157,543Top 5%
22
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12424433 Method for manufacturing metal fluoride-containing organic polymer film, patterning method, and method for manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura, Ryosuke Yamamoto 2025-09-23
12353131 Method for manufacturing indium-containing organic polymer film, patterning method, and method for manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2025-07-08
12228860 Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2025-02-18
12018107 Polymer material, composition, and method of manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2024-06-25
11820840 Compound, polymer, pattern forming material, and manufacturing method of semiconductor device Koji Asakawa, Shinobu Sugimura 2023-11-21
11796915 Compound, polymer, pattern forming material, pattern forming method, and method of manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2023-10-24
11639402 Polymer for pattern forming material Koji Asakawa, Shinobu Sugimura 2023-05-02
11410848 Method of forming pattern, method of manufacturing semiconductor device, and pattern-forming material Koji Asakawa, Shinobu Sugimura 2022-08-09
11393671 Method of forming pattern and method of manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2022-07-19
11378885 Pattern formation material and pattern formation method Koji Asakawa, Naoko Kihara, Seekei Lee, Tomoaki Sawabe, Shinobu Sugimura 2022-07-05
11320736 Pattern forming material and pattern forming method Ryosuke Yamamoto, Seiji Morita, Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura 2022-05-03
11192971 Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2021-12-07
11192972 Polymer material, composition, and method of manufacturing semiconductor device Koji Asakawa, Shinobu Sugimura 2021-12-07
11177129 Method of manufacturing semiconductor device, method of forming pattern film, and metal-containing organic film Koji Asakawa, Shinobu Sugimura 2021-11-16
11161999 Pattern formation method, block copolymer, and pattern formation material Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura 2021-11-02
10877374 Pattern formation method and pattern formation material Koji Asakawa, Seekei Lee, Naoko Kihara, Tomoaki Sawabe, Shinobu Sugimura 2020-12-29
10672621 Pattern forming material, pattern forming method, and method for manufacturing semiconductor device Koji Asakawa, Tomoaki Sawabe, Shinobu Sugimura 2020-06-02
8956560 Method of manufacturing mold Yasuaki Ootera, Yoshiyuki Kamata, Naoko Kihara, Yoshiaki Kawamonzen, Takeshi Okino +5 more 2015-02-17
8916053 Pattern forming method Yoshiaki Kawamonzen, Yasuaki Ootera, Akiko Yuzawa, Naoko Kihara, Yoshiyuki Kamata +5 more 2014-12-23
8865010 Pattern forming method and imprint mold manufacturing method Naoko Kihara, Hiroyuki Hieda, Akiko Yuzawa, Ryosuke Yamamoto, Yoshiyuki Kamata 2014-10-21
7852537 Optical recording medium and method of manufacturing the same Akiko Hirao, Kazuki Matsumoto, Rumiko Hayase, Takahiro Kamikawa 2010-12-14
7601465 Holographic recording medium Rumiko Hayase, Akiko Hirao, Kazuki Matsumoto 2009-10-13