Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11243468 | Composition for resist underlayer film formation, resist underlayer film and formation method thereof, and patterned substrate production method | Naoya Nosaka, Goji Wakamatsu, Tsubasa Abe, Ichihiro Miura, Hiroki Nakatsu +1 more | 2022-02-08 |