Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
JY

Jingjun Yang — 9 Patents

Honeywell: 3 patents #5,294 of 16,504Top 35%
Dow Global Technologies: 2 patents #1,896 of 4,534Top 45%
Applied Materials: 2 patents #3,681 of 7,310Top 55%
Huawei: 1 patents #8,318 of 15,535Top 55%
Cupertino, CA: #1,765 of 6,989 inventorsTop 30%
California: #67,547 of 386,348 inventorsTop 20%
Overall (All Time): #535,341 of 4,157,543Top 15%
9 Patents All Time
Jingjun Yang has been granted 9 US patents. The first was granted in 2000 and the most recent in December 2015. Jingjun Yang ranks #535,341 of 4,157,543 US inventors in our database (top 12.9%). Patent records list Jingjun Yang in Cupertino, CA, US.

Patents per Year

Patents granted per year, 2000 to 2015Bar chart with a peak of 3 patents in 2015.peak 32000: 2 patents20002001: 2 patents20012003: 1 patents20032007: 1 patents20072015: 3 patents2015

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
9203528 Method for reducing frequency band interference for multi-mode terminal, multi-mode terminal, and network device Xiaochun ZHENG, Xuehong Zeng 2015-12-01
9139796 Methods of and formulations for reducing and inhibiting the growth of the concentration of microbes in water-based fluids and systems used with them Bei Yin, Pierre Marie Lenoir 2015-09-22 $22,789,000
8952199 Methods of and formulations for reducing and inhibiting the growth of the concentration of microbes in water-based fluids and systems used with them Bei Yin 2015-02-10 $61,440,000
7309514 Electron beam modification of CVD deposited films, forming low dielectric constant materials Matthew Ross, Heike Thompson 2007-12-18 $45,733,000
6582777 Electron beam modification of CVD deposited low dielectric constant materials Matthew Ross, Heike Thompson 2003-06-24 $19,441,000
6235353 Low dielectric constant films with high glass transition temperatures made by electron beam curing James Drage, Dong Kyu Choi 2001-05-22 $37,914,000
6177143 Electron beam treatment of siloxane resins Carl Treadwell, Matthew Ross 2001-01-23
6080526 Integration of low-k polymers into interlevel dielectrics using controlled electron-beam radiation Lynn Forester, Dong Kyu Choi, Shi-Qing Wang, Neil H. Hendricks 2000-06-27 $33,854,000
6042994 Nanoporous silica dielectric films modified by electron beam exposure and having low dielectric constant and low water content James Drage, Lynn Forester 2000-03-28 $41,604,000