Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electron beam modification of CVD deposited low dielectric constant materials

Electron beam modification of CVD deposited low dielectric constant materials

US Patent 6582777 · Granted Jun 24, 2003

Estimated economic value: $19,441,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical instrumentation including a spatially variable filter2021
Metal working fluid2021
Emulsifier for use in lubricating oil2019
Optical spectrometer configuration including spatially variable filter (SVF)2019
Method for reducing frequency band interference for multi-mode terminal, multi-m2015
Methods of and formulations for reducing and inhibiting the growth of the concen2015
Methods of and formulations for reducing and inhibiting the growth of the concen2015
Electron beam modification of CVD deposited films, forming low dielectric consta2007
Electron beam modification of CVD deposited films, forming low dielectric consta2007
Electron beam modification of CVD deposited films, forming low dielectric consta2007
E-beam curable resist and process for e-beam curing the resist2006
Method for modifying resist images by electron beam exposure2005