Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11487204 | Resist material | Shinya Yamamoto, Masanori Miyamoto | 2022-11-01 |
| 11472763 | Calixarene compound, curable composition, and cured product | Shinya Yamamoto, Yutaka Kadomoto, Masanori Miyamoto, Hidetomo Kai | 2022-10-18 |
| 11254778 | Novolak resins and resist materials | Yusuke Sato | 2022-02-22 |
| 11111225 | Calixarene compound and curable composition | Shinya Yamamoto, Masanori Miyamoto | 2021-09-07 |
| 10577449 | Phenolic-hydroxyl-group-containing novolac resin and resist film | Yusuke Sato | 2020-03-03 |
| 10466590 | Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating | — | 2019-11-05 |
| 10414850 | Resin containing phenolic hydroxyl groups, and resist film | Yusuke Sato | 2019-09-17 |
| 10266471 | Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition | Norio Nagae | 2019-04-23 |
| 10179828 | Curable composition for permanent resist films, and permanent resist film | — | 2019-01-15 |
| 10047186 | Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film | Yusuke Sato | 2018-08-14 |
| 10047185 | Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resist | Yusuke Sato | 2018-08-14 |
| 9975830 | Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film | — | 2018-05-22 |
| 9963536 | Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film | Seiji Kimoto, Shigenobu Kida | 2018-05-08 |
| 9828457 | Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film | Yusuke Sato, Seiji Kimoto | 2017-11-28 |
| 9765175 | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | Yusuke Sato | 2017-09-19 |
| 9550723 | Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition | Takakazu Kage, Dongmi Shin | 2017-01-24 |
| 9481631 | Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist material | Dongmi Shin, Takakazu Kage | 2016-11-01 |
| 9469592 | Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition | Takakazu Kage, Dongmi Shin | 2016-10-18 |
| 9441344 | Controller assembly, cab for work machine, and work machine | Hiroaki Tanaka, Daisuke Tsukamoto, Hirokazu Sugimoto, Yoshiaki Honma | 2016-09-13 |
| 8946374 | Polyether ester composition, polyurethane resin composition, and optical material using the same | Kouji Shiraishi | 2015-02-03 |
| 8846297 | Positive photoresist composition, coating film thereof, and novolac phenol resin | Takakazu Kage, Norifumi Imaizumi | 2014-09-30 |
| 8816033 | Radically curable compound, cured product thereof, and method for producing the compound | Takakazu Kage, Norifumi Imaizumi | 2014-08-26 |
| 8623585 | Positive-type photoresist composition | Takakazu Kage, Norifumi Imaizumi | 2014-01-07 |
| 7569654 | Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin | Ichiro Ogura, Nobuya Nakamura | 2009-08-04 |
| 7456247 | Phenolic resin formed from a difunctional phenol and a divinyl ether | Ichiro Ogura, Nobuya Nakamura | 2008-11-25 |