Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9550723 | Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition | Tomoyuki Imada, Dongmi Shin | 2017-01-24 |
| 9481631 | Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist material | Dongmi Shin, Tomoyuki Imada | 2016-11-01 |
| 9469592 | Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition | Tomoyuki Imada, Dongmi Shin | 2016-10-18 |
| 8846297 | Positive photoresist composition, coating film thereof, and novolac phenol resin | Tomoyuki Imada, Norifumi Imaizumi | 2014-09-30 |
| 8816033 | Radically curable compound, cured product thereof, and method for producing the compound | Tomoyuki Imada, Norifumi Imaizumi | 2014-08-26 |
| 8632946 | Positive-type photoresist composition | Norifumi Imaizumi | 2014-01-21 |
| 8623585 | Positive-type photoresist composition | Tomoyuki Imada, Norifumi Imaizumi | 2014-01-07 |