Tomoyuki Imada — 28 Patents at Dic

Tomoyuki Imada has been granted 28 US patents while listed as an inventor at Dic. The first was granted in 2004 and the most recent in November 2022. Tomoyuki Imada ranks #134,628 of 4,157,543 US inventors in our database (top 3.2%). Patent records list Tomoyuki Imada in Ichihara, JP.

Issued Patents All Time

Showing 1–25 of 28 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
11487204	Resist material	Shinya Yamamoto, Masanori Miyamoto	2022-11-01	$18,130,000
11472763	Calixarene compound, curable composition, and cured product	Shinya Yamamoto, Yutaka Kadomoto, Masanori Miyamoto, Hidetomo Kai	2022-10-18	$11,317,000
11254778	Novolak resins and resist materials	Yusuke Sato	2022-02-22	$16,582,000
11111225	Calixarene compound and curable composition	Shinya Yamamoto, Masanori Miyamoto	2021-09-07
10577449	Phenolic-hydroxyl-group-containing novolac resin and resist film	Yusuke Sato	2020-03-03
10466590	Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating	—	2019-11-05
10414850	Resin containing phenolic hydroxyl groups, and resist film	Yusuke Sato	2019-09-17
10266471	Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition	Norio Nagae	2019-04-23
10179828	Curable composition for permanent resist films, and permanent resist film	—	2019-01-15
10047186	Novolac phenol resin, manufacturing method therefor, photosensitive composition, resist material and coating film	Yusuke Sato	2018-08-14
10047185	Novolac-type phenolic hydroxyl group-containing resin, production method therefor, curable composition, composition for resist, and color resist	Yusuke Sato	2018-08-14
9975830	Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film	—	2018-05-22
9963536	Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film	Seiji Kimoto, Shigenobu Kida	2018-05-08
9828457	Compound containing phenolic hydroxy group, photosensitive composition, composition for resists, resist coating film, curable composition, composition for resist underlayer films, and resist underlayer film	Yusuke Sato, Seiji Kimoto	2017-11-28
9765175	Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating	Yusuke Sato	2017-09-19
9550723	Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition	Takakazu Kage, Dongmi Shin	2017-01-24
9481631	Phenolic hydroxyl group-containing compound, phenolic hydroxyl group-containing composition, (meth)acryloyl group-containing resin, curable composition, cured product thereof, and resist material	Dongmi Shin, Takakazu Kage	2016-11-01
9469592	Radically curable compound, method for producing radically curable compound, radically curable composition, cured product of the same, and resist-material composition	Takakazu Kage, Dongmi Shin	2016-10-18
9441344	Controller assembly, cab for work machine, and work machine	Hiroaki Tanaka, Daisuke Tsukamoto, Hirokazu Sugimoto, Yoshiaki Honma	2016-09-13
8946374	Polyether ester composition, polyurethane resin composition, and optical material using the same	Kouji Shiraishi	2015-02-03
8846297	Positive photoresist composition, coating film thereof, and novolac phenol resin	Takakazu Kage, Norifumi Imaizumi	2014-09-30
8816033	Radically curable compound, cured product thereof, and method for producing the compound	Takakazu Kage, Norifumi Imaizumi	2014-08-26
8623585	Positive-type photoresist composition	Takakazu Kage, Norifumi Imaizumi	2014-01-07
7569654	Epoxy resin composition, process for producing epoxy resin, novel epoxy resin, novel phenol resin	Ichiro Ogura, Nobuya Nakamura	2009-08-04
7456247	Phenolic resin formed from a difunctional phenol and a divinyl ether	Ichiro Ogura, Nobuya Nakamura	2008-11-25

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Tomoyuki Imada — 28 Patents

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