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Semiconductor device including a field effect transistor with nanostructure based laminated channel structure and a field effect transistor with a single channel structure |
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Solid-state image sensor |
Masami Nagata |
2025-06-24 |
| 11985443 |
Solid-state image sensor |
Masami Nagata |
2024-05-14 |
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Semiconductor device |
Yuzo Fukuzaki, Shinichi Miyake, Kazuyuki Tomida |
2024-04-16 |
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Semiconductor device |
Yuzo Fukuzaki, Shinichi Miyake, Kazuyuki Tomida |
2022-10-18 |
| 10991723 |
Semiconductor device, method of manufacturing semiconductor device, and electronic apparatus |
— |
2021-04-27 |
| RE38363 |
Method of forming trench isolation having polishing step and method of manufacturing semiconductor device |
Hideaki Hayakawa |
2003-12-23 |
| 6258654 |
Method of manufacturing a semiconductor device |
— |
2001-07-10 |
| 6218266 |
Method of fabricating electronic devices of the type including smoothing process using polishing |
Junichi Sato |
2001-04-17 |
| 5700349 |
Method for forming multi-layer interconnections |
Masanori Tsukamoto |
1997-12-23 |
| 5698352 |
Semiconductor device containing Si, O and N anti-reflective layer |
Tohru Ogawa |
1997-12-16 |
| 5648202 |
Method of forming a photoresist pattern using an anti-reflective |
Tohru Ogawa |
1997-07-15 |
| 5641607 |
Anti-reflective layer used to form a semiconductor device |
Tohru Ogawa |
1997-06-24 |
| 5632910 |
Multilayer resist pattern forming method |
Tetsuji Nagayama |
1997-05-27 |
| 5600165 |
Semiconductor device with antireflection film |
Masanori Tsukamoto |
1997-02-04 |
| 5502008 |
Method for forming metal plug and/or wiring metal layer |
Hideaki Hayakawa, Junichi Sato |
1996-03-26 |
| 5498565 |
Method of forming trench isolation having polishing step and method of manufacturing semiconductor device |
Hideaki Hayakawa |
1996-03-12 |
| 5472827 |
Method of forming a resist pattern using an anti-reflective layer |
Tohru Ogawa |
1995-12-05 |
| 5254171 |
Bias ECR plasma CVD apparatus comprising susceptor, clamp, and chamber wall heating and cooling means |
Hideaki Hayakawa, Junichi Sato |
1993-10-19 |
| 5242853 |
Manufacturing process for a semiconductor device using bias ECRCVD and an etch stop layer |
Junichi Sato, Yasushi Morita |
1993-09-07 |