| 12243749 |
Methods to provide uniform wet etching of material within high aspect ratio features provided on a patterned substrate |
Shan Hu, Henan Zhang, Sangita Kumari |
2025-03-04 |
| 12148624 |
Wet etch process and method to control fin height and channel area in a fin field effect transistor (FinFET) |
Shan Hu, Eric Chih-Fang Liu, Henan Zhang, Sangita Kumari |
2024-11-19 |
| 12148625 |
Methods to prevent surface charge induced cd-dependent etching of material formed within features on a patterned substrate |
Shan Hu, Henan Zhang, Sangita Kumari, Robert D. Clark |
2024-11-19 |
| 12100598 |
Methods for planarizing a substrate using a combined wet etch and chemical mechanical polishing (CMP) process |
Shan Hu, Eric Chih-Fang Liu, Henan Zhang, Sangita Kumari |
2024-09-24 |
| 12100599 |
Wet etch process and method to provide uniform etching of material formed within features having different critical dimension (CD) |
Shan Hu, Henan Zhang, Sangita Kumari |
2024-09-24 |