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Sequential UV induced chemical vapor deposition |
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2011-03-01 |
| 7157798 |
Selective refractory metal and nitride capping |
James A. Fair, Robert H. Havemann, Jungwan Sung, Sang-Hyeob Lee, Mary Anne Plano |
2007-01-02 |
| 7144806 |
ALD of tantalum using a hydride reducing agent |
James A. Fair, Jungwan Sung |
2006-12-05 |
| 6905543 |
Methods of forming tungsten nucleation layer |
James A. Fair, Junghwan Sung |
2005-06-14 |
| 6844258 |
Selective refractory metal and nitride capping |
James A. Fair, Robert H. Havemann, Jungwan Sung, Sang-Hyeob Lee, Mary Anne Plano |
2005-01-18 |
| 6720260 |
Sequential electron induced chemical vapor deposition |
James A. Fair |
2004-04-13 |
| 6627268 |
Sequential ion, UV, and electron induced chemical vapor deposition |
James A. Fair, Wilbert van den Hoek |
2003-09-30 |