Issued Patents All Time
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6242160 | Patterning method of chemical amplification type resist film for far ultraviolet radiation | Shinichi Fukuzawa | 2001-06-05 |
| 5792596 | Pattern forming method | Tadao Yasuzato, Shinji Ishida, Yoko Iwabuchi | 1998-08-11 |
| 5786113 | Photo-mask used in aligner for exactly transferring main pattern assisted by semi-transparent auxiliary pattern and process of fabrication thereof | Shuichi Hashimoto | 1998-07-28 |
| 5665519 | Resist material | — | 1997-09-09 |