Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10607853 | CMP slurry composition for polishing copper line and polishing method using same | Dong-Hun Kang, Jeong Hwan Jeong, Young Nam Choi | 2020-03-31 |
| 10150890 | CMP slurry composition for polishing copper and polishing method using the same | Jeong Hwan Jeong, Young Chul Jung, Dong-Hun Kang, Tae Wan Kim, Chang-Ki Hong | 2018-12-11 |
| 9695347 | Slurry composition for chemical mechanical polishing of metal and polishing method using the same | Homer Chou, Won-Lae Kim, In Kyung Lee, Tae Young Lee | 2017-07-04 |
| 9593260 | CMP slurry composition for polishing copper, and polishing method using same | Dong-Hun Kang, Tae Wan Kim, Jeong Hwan Jeong, Young Nam Choi, Chang-Ki Hong | 2017-03-14 |