Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4931380 | Pre-exposure method for increased sensitivity in high contrast resist development of positive working diazo ketone photoresist | Robert A. Owens, Roland L. Chin, Susan A. Ferguson | 1990-06-05 |
| 4824769 | High contrast photoresist developer | Robert A. Owens | 1989-04-25 |
| 4822722 | Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image | Robert A. Owens, Susan A. Ferguson, Roland L. Chin, Valentine T Zuba | 1989-04-18 |
| 4710449 | High contrast low metal ion positive photoresist developing method using aqueous base solutions with surfactants | Andrew J. Blakeney | 1987-12-01 |
| 4670372 | Process of developing radiation imaged photoresist with alkaline developer solution including a carboxylated surfactant | Robert A. Owens | 1987-06-02 |
| 4661436 | Process of forming high contrast resist pattern in positive photoagent material using alkalai developer with fluorocarbon surfactant | Robert A. Owens, Andrew J. Blakeney | 1987-04-28 |
| 4613561 | Method of high contrast positive O-quinone diazide photoresist developing using pretreatment solution | — | 1986-09-23 |
| 4526856 | Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents | Robert A. Owens, Richard F. Sweeney, Ronald W. Wake, Robert E. Rinehart | 1985-07-02 |
| 4278753 | Plasma developable photoresist composition with polyvinyl formal binder | Eugene F. McInerney | 1981-07-14 |
| 4187105 | Photosensitive image forming composition containing at least one substituted bis-diaryl vinylidene compound and/or at least one substituted bis-diaryl imine compound | Eugene Wainer | 1980-02-05 |