Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10969702 | Extreme ultraviolet lithography apparatus | Mun Ja Kim | 2021-04-06 |
| 10103071 | Pattern inspection methods and methods of fabricating reticles using the same via directing charged particle beams through discharge layers | Jin Sung Choi, Mun Ja Kim, Kijung Son | 2018-10-16 |