| 10269662 |
Scanning methods for focus control for lithographic processing of reconstituted wafers |
Paul M. Bischoff, Raymond Ellis, A. J. Crespin |
2019-04-23 |
| 9436103 |
Wynne-Dyson projection lens with reduced susceptibility to UV damage |
Peiqian Zhao, Raymond Ellis, Andrew M. Hawryluk |
2016-09-06 |
| RE44116 |
Substrate-alignment using detector of substrate material |
Ray Ellis, Shiyu Zhang |
2013-04-02 |
| 8299446 |
Sub-field enhanced global alignment |
Andrew M. Hawryluk, Manish Ranjan, Warren W. Flack, Detlef Fuchs |
2012-10-30 |
| 8017424 |
Dual-sided substrate measurement apparatus and methods |
Albert J. Crespin, Jim Woodruff, Ray Ellis, Scott Kulas, Joe Jamello |
2011-09-13 |
| 7902040 |
Dual-sided substrate measurement apparatus and methods |
Albert J. Crespin, Jim Woodruff, Ray Ellis, Scott Kulas, Joe Jamello |
2011-03-08 |
| 7751067 |
Substrate-alignment using detector of substrate material |
Ray Ellis, Shiyu Zhang |
2010-07-06 |
| 7528937 |
Dual-sided substrate measurement apparatus and methods |
Albert J. Crespin, Jim Woodruff, Ray Ellis, Scott Kulas, Joe Jamello |
2009-05-05 |