CO

Christopher E. Osuch

HC Hoechst Celanese: 9 patents #64 of 871Top 8%
AL Alliedsignal: 2 patents #730 of 2,631Top 30%
AR American Regent: 2 patents #82 of 274Top 30%
HO Honeywell: 2 patents #4,946 of 14,447Top 35%
Overall (All Time): #293,134 of 4,157,543Top 8%
16
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11408826 Portable organic molecular sensing device and related systems and methods Heinz Wolter, Alexander Leyn, Michael J. Fisher, Erik Borg, Gregory John Adams Vilk +2 more 2022-08-09
10605740 Portable organic molecular sensing device and related systems and methods Heinz Wolter, Alexander Leyn, Michael J. Fisher, Erik Borg, Gregory John Adams Vilk +2 more 2020-03-31
6899161 Method for heat absorption using polyoxymethylene polymer compositions Jane Ren, Richard A. Olzak 2005-05-31
6365244 Method for heat absorption using polyoxymethylene polymer compositions Jane Ren, Richard A. Olzak 2002-04-02
6143978 Enclosure for dissipating heat away from a heat sensitive device using bicarbonate compositions Jane Ren, Richard A. Olzak, Amanda L. Plyley 2000-11-07
6078011 Method for dissipating heat away from a heat sensitive device using bicarbonate composition Jane Ren, Richard A. Olzak, Amanda L. Plyley 2000-06-20
5932839 Method for dissipating heat away from a heat sensitive device using bicarbonate compositions Jane Ren, Richard A. Olzak, Amanda L. Plyley 1999-08-03
5200529 Blocked monomer and polymers therefrom for use as photoresists Michael J. McFarland 1993-04-06
5081001 Blocked monomer and polymers therefrom for use as photoresists Michael J. McFarland 1992-01-14
5059513 Photochemical image process of positive photoresist element with maleimide copolymer Frederick R. Hopf, Michael J. McFarland 1991-10-22
4968581 High resolution photoresist of imide containing polymers Chengjiu Wu, Anne Mooring, Michael J. McFarland, James T. Yardley 1990-11-06
4962171 Blocked monomer and polymers therefrom for use as photoresists Michael J. McFarland 1990-10-09
4912018 High resolution photoresist based on imide containing polymers Michael J. McFarland 1990-03-27
4857435 Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer Frederick R. Hopf, Michael J. McFarland 1989-08-15
4837124 High resolution photoresist of imide containing polymers Chengjiu Wu, Anne Mooring, Michael J. McFarland, James T. Yardley 1989-06-06
4810613 Blocked monomer and polymers therefrom for use as photoresists Michael J. McFarland 1989-03-07