Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5182185 | Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions | Chengjiu Wu, James T. Yardley | 1993-01-26 |
| 5039596 | Deep u.v. photoresist process utilizing compositions containing polycyclic cyclopentane 2-diazo-1,3-dione | Chengjiu Wu, James T. Yardley | 1991-08-13 |
| 4968581 | High resolution photoresist of imide containing polymers | Chengjiu Wu, Michael J. McFarland, Christopher E. Osuch, James T. Yardley | 1990-11-06 |
| 4837124 | High resolution photoresist of imide containing polymers | Chengjiu Wu, Michael J. McFarland, Christopher E. Osuch, James T. Yardley | 1989-06-06 |