CH

Christopher Hamaker

Applied Materials: 1 patents #4,780 of 7,310Top 70%
Overall (All Time): #3,421,028 of 4,157,543Top 85%
1
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7067227 Sensitized chemically amplified photoresist for use in photomask fabrication and semiconductor processing Melvin Montgomery 2006-06-27