Issued Patents All Time
Showing 1–25 of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7977017 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | — | 2011-07-12 |
| 7910270 | Reticle constructions | — | 2011-03-22 |
| 7826033 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | — | 2010-11-02 |
| 7759660 | Electron beam lithography system | — | 2010-07-20 |
| 7754399 | Methods of forming reticles | — | 2010-07-13 |
| 7569314 | Method for quartz bump defect repair with less substrate damage | Matthew Lamantia | 2009-08-04 |
| 7556897 | Methods of forming reticles | — | 2009-07-07 |
| 7442472 | Methods of forming reticles | — | 2008-10-28 |
| 7432025 | Methods of forming reticles | — | 2008-10-07 |
| 7309549 | Method for quartz bump defect repair with less substrate damage | Matthew Lamantia | 2007-12-18 |
| 7258954 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | — | 2007-08-21 |
| 7229725 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | — | 2007-06-12 |
| 7229742 | Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system | — | 2007-06-12 |
| 7226723 | Methods for improving angled line feature accuracy and throughput using electron beam lithography and electron beam lithography system | — | 2007-06-05 |
| 7147973 | Method to recover the exposure sensitivity of chemically amplified resins from post coat delay effect | — | 2006-12-12 |
| 6933081 | Method for quartz bump defect repair with less substrate damage | Matthew Lamantia | 2005-08-23 |
| 6723476 | Methods of patterning materials; and photomasks | — | 2004-04-20 |
| 6534223 | Method of forming a circuitry fabrication mask having a subtractive alternating phase shift region | — | 2003-03-18 |
| 6525317 | Reduction of charging effect and carbon deposition caused by electron beam devices | — | 2003-02-25 |
| 6447962 | Method for repairing MoSi attenuated phase shift masks | — | 2002-09-10 |
| 6373976 | Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems | Christophe Pierrat | 2002-04-16 |
| 6297879 | Inspection method and apparatus for detecting defects on photomasks | Christophe Pierrat | 2001-10-02 |
| 6291115 | Method for repairing bump and divot defects in a phase shifting mask | — | 2001-09-18 |
| 6277526 | Method for repairing MoSi attenuated phase shift masks | — | 2001-08-21 |
| 6114073 | Method for repairing phase shifting masks | — | 2000-09-05 |