Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12406197 | Prediction and metrology of stochastic photoresist thickness defects | Guy Parsey, Kunlun Bai, Pradeep Vukkadala, Cao Zhang, John S. Graves +2 more | 2025-09-02 |
| 11966156 | Lithography mask repair by simulation of photoresist thickness evolution | Pradeep Vukkadala, Guy Parsey, Kunlun Bai, Xiaohan Li, Cao Zhang +2 more | 2024-04-23 |