| 9156125 |
Polishing pad with light-stable light-transmitting region |
— |
2015-10-13 |
| 8075372 |
Polishing pad with microporous regions |
— |
2011-12-13 |
| 7699684 |
CMP porous pad with component-filled pores |
— |
2010-04-20 |
| 7686994 |
Method of preparing a conductive film |
Ronald E. Myers |
2010-03-30 |
| 7435161 |
Multi-layer polishing pad material for CMP |
Michael S. Lacy |
2008-10-14 |
| 7435165 |
Transparent microporous materials for CMP |
— |
2008-10-14 |
| 7311862 |
Method for manufacturing microporous CMP materials having controlled pore size |
— |
2007-12-25 |
| 7267607 |
Transparent microporous materials for CMP |
— |
2007-09-11 |
| 7264641 |
Polishing pad comprising biodegradable polymer |
— |
2007-09-04 |
| 7204742 |
Polishing pad comprising hydrophobic region and endpoint detection port |
— |
2007-04-17 |
| 7195544 |
CMP porous pad with component-filled pores |
— |
2007-03-27 |
| 7059936 |
Low surface energy CMP pad |
— |
2006-06-13 |
| 6998166 |
Polishing pad with oriented pore structure |
— |
2006-02-14 |
| 6960120 |
CMP pad with composite transparent window |
— |
2005-11-01 |
| 6935931 |
Microporous polishing pads |
— |
2005-08-30 |
| 6913517 |
Microporous polishing pads |
— |
2005-07-05 |
| 6899598 |
Microporous polishing pads |
— |
2005-05-31 |
| 6896593 |
Microporous polishing pads |
— |
2005-05-24 |
| 6884156 |
Multi-layer polishing pad material for CMP |
Roland Sevilla, Michael S. Lacy |
2005-04-26 |