Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8754482 | Semiconductor device and manufacturing method thereof | Huaxiang Yin, Dapeng Chen | 2014-06-17 |
| 8748250 | Method for integration of dual metal gates and dual high-K dielectrics in CMOS devices | Gaobo Xu | 2014-06-10 |
| 8748272 | Method of introducing strain into channel and device manufactured by using the method | Huaxiang Yin, Dapeng Cheng | 2014-06-10 |
| 8703617 | Method for planarizing interlayer dielectric layer | Huaxiang Yin, Lingkuan Meng, Tao Yang, Dapeng Chen | 2014-04-22 |
| 8664119 | Semiconductor device manufacturing method | Huaxiang Yin, Lingkuan Meng, Dapeng Chen | 2014-03-04 |
| 8652893 | Semiconductor device and manufacturing method thereof | Huaxiang Yin, Dapeng Chen | 2014-02-18 |
| 8652891 | Semiconductor device and method of manufacturing the same | Huaxiang Yin, Changliang Qin, Dapeng Chen | 2014-02-18 |
| 8598002 | Method for manufacturing metal gate stack structure in gate-first process | Yongliang Li | 2013-12-03 |
| 8574977 | Method for manufacturing stack structure of PMOS device and adjusting gate work function | Yongliang Li | 2013-11-05 |
| 8530302 | Method for manufacturing CMOS FET | Yongliang Li, Gaobo Xu | 2013-09-10 |
| 8466028 | Method for manufacturing multigate device | Huaxiang Yin, Dapeng Chen | 2013-06-18 |
| 8389367 | Method for manufacturing a semiconductor device | Huajie Zhou | 2013-03-05 |
| 8384162 | Device having adjustable channel stress and method thereof | Huaxiang Yin, Dapeng Chen | 2013-02-26 |
| 8377769 | Method for integrating replacement gate in semiconductor device | Gaobo Xu | 2013-02-19 |
| 8367558 | Method for tuning the work function of a metal gate of the PMOS device | Gaobo Xu | 2013-02-05 |
| 8361869 | Method for manufacturing suspended fin and gate-all-around field effect transistor | Huajie Zhou, Yi Song | 2013-01-29 |
| 8338084 | Patterning method | Huajie Zhou | 2012-12-25 |
| 8334205 | Method for removing polymer after etching gate stack structure of high-K gate dielectric/metal gate | Yongliang Li | 2012-12-18 |
| 8324061 | Method for manufacturing semiconductor device | Huaxiang Yin, Gaobo Xu, Lingkuan Meng, Tao Yang, Dapeng Chen | 2012-12-04 |
| 8298927 | Method of adjusting metal gate work function of NMOS device | Gaobo Xu | 2012-10-30 |
| 8278026 | Method for improving electron-beam | Gaobo Xu | 2012-10-02 |
| 8258063 | Method for manufacturing a metal gate electrode/high K dielectric gate stack | Yongliang Li | 2012-09-04 |
| 8163620 | Method for etching Mo-based metal gate stack with aluminium nitride barrier | Yongliang Li | 2012-04-24 |
| 7960235 | Method for manufacturing a MOSFET with a surrounding gate of bulk Si | Yi Song, Huajie Zhou | 2011-06-14 |