Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7067366 | Method of making field effect transistors having self-aligned source and drain regions using independently controlled spacer widths | — | 2006-06-27 |
| 6967375 | Reduction of chemical mechanical planarization (CMP) scratches with sacrificial dielectric polish stop | George R. Goth | 2005-11-22 |