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Light-emitting device |
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2022-03-15 |
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Light emitting device |
Shigenori Murakami |
2021-09-21 |
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Light-emitting system and mobile object |
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2020-11-17 |
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Light-emitting system |
— |
2020-09-08 |
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Beam recording apparatus and beam adjustment method |
Yasumitsu Wada |
2011-01-25 |
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Electron beam drawing apparatus |
— |
2010-03-16 |
| 7525107 |
Apparatus and method for forming an alignment layer |
Johji Nakagaki, Akihiro Asahara, Hideo Kimura, Tatsuya Nishiwaki, Yasuhiko Shiota +1 more |
2009-04-28 |
| 7276692 |
Beam adjusting sample, beam adjusting method and beam adjusting device |
Masahiro Katsumura, Yoshiaki Kojima, Yasumitsu Wada |
2007-10-02 |
| 6954273 |
Laser-based measuring apparatus for measuring an axial run-out in a cylinder of rotation and method for measuring the same utilizing opposing incident measuring light beams |
Yoshiaki Kojima, Yasumitsu Wada |
2005-10-11 |
| 6943894 |
Laser distance measuring system and laser distance measuring method |
— |
2005-09-13 |
| 6798466 |
Liquid crystal display device and method for fabricating the same |
Masatomo Takeichi |
2004-09-28 |
| 6654075 |
Liquid crystal display device and method for fabricating the same |
Masatomo Takeichi |
2003-11-25 |
| 6429058 |
Method of forming fully self-aligned TFT improved process window |
Evan G. Colgan, Hisanori Kinoshita, Kai Schleupen |
2002-08-06 |
| 6403407 |
Method of forming fully self-aligned TFT with improved process window |
Paul S. Andry, Evan G. Colgan, Hisanori Kinoshita, Frank R. Libsch, Kai Schleupen |
2002-06-11 |
| 6258723 |
Dry etching method and a TFT fabrication method |
Masatomo Takeichi |
2001-07-10 |
| 6091151 |
Wiring layer and method of forming the wiring layer |
Hiroshi Takatsuji, Satoshi Tsuji |
2000-07-18 |
| 5598283 |
Short circuit line having a conductive extension between groups of terminals in a liquid crystal display device |
Yoshiharu Fujii, Toshihiko Yoshida |
1997-01-28 |
| 5464500 |
Method for taper etching metal |
Takatoshi Tsujimura |
1995-11-07 |
| 5373377 |
Liquid crystal device with shorting ring and transistors for electrostatic discharge protection |
Meiko Ogawa, Kouhei Suzuki, Shinichi Kimura, Yoshikazu Ichioka |
1994-12-13 |
| 4825808 |
Substrate processing apparatus |
Nobuyuki Takahashi |
1989-05-02 |
| 4588942 |
Thickness monitoring system for intermittently exposing a quartz crystal to a material to be deposited |
— |
1986-05-13 |