Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5221425 | Method for reducing foreign matter on a wafer etched in a reactive ion etching process | Gary W. Blanchard, Charles R. Bossi, Thomas Warren Weeks, Jr. | 1993-06-22 |
| 4717448 | Reactive ion etch chemistry for providing deep vertical trenches in semiconductor substrates | Randy Dean Cox, Arthur B. Israel | 1988-01-05 |
| 4377633 | Methods of simultaneous contact and metal lithography patterning | Karen M. Abrahamovich, Clifford J. Hamel, Dean R. Weed | 1983-03-22 |