Issued Patents All Time
Showing 26–50 of 52 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5821131 | Method for inspecting process defects occurring in semiconductor devices | — | 1998-10-13 |
| 5817445 | Method for inspecting process defects occurring in semiconductor devices | — | 1998-10-06 |
| 5811223 | Method for inspecting process defects occurring in semiconductor devices | — | 1998-09-22 |
| 5776640 | Photo mask for a process margin test and a method for performing a process margin test using the same | — | 1998-07-07 |
| 5766809 | Method for testing overlay in a semiconductor device utilizing inclined measuring mark | — | 1998-06-16 |
| 5741625 | Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material | Seung Chan Moon | 1998-04-21 |
| 5721074 | Method for fabricating a light exposure mask comprising the use of a process defect inspection system | — | 1998-02-24 |
| 5716758 | Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks | Seung Chan Moon | 1998-02-10 |
| 5705319 | Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers | Seung Chan Moon | 1998-01-06 |
| 5705300 | Phase shift mask and method for fabricating the same | — | 1998-01-06 |
| 5698350 | Light exposure method for the fabrication of semiconductor devices | — | 1997-12-16 |
| 5698347 | Reticle for off-axis illumination | — | 1997-12-16 |
| 5675418 | Pattern alignment mark of semiconductor device | Byoung Il Choi | 1997-10-07 |
| 5668042 | Method for aligning micro patterns of a semiconductor device | — | 1997-09-16 |
| 5635336 | Method for the preparation of a pattern overlay accuracy-measuring mark | — | 1997-06-03 |
| 5635335 | Method for fabricating semiconductor device utilizing dual photoresist films imaged with same exposure mask | Seung Chan Moon | 1997-06-03 |
| 5633173 | Method for detecting wafer defects | — | 1997-05-27 |
| 5598250 | Prefabricated modified illumination apparatus for forming fine patterns in a semiconductor device | — | 1997-01-28 |
| 5578423 | Method for the preparation of a pattern overlay accuracy-measuring mark | — | 1996-11-26 |
| 5571641 | Diffraction mask for the fabrication of semiconductor devices | — | 1996-11-05 |
| 5563009 | Photomask for forming a micropattern of a semiconductor device | — | 1996-10-08 |
| 5536534 | Method and apparatus for coating photoresist | — | 1996-07-16 |
| 5532114 | Method of forming a photoresist pattern in a semiconductor device | — | 1996-07-02 |
| 5508133 | Photo mask | — | 1996-04-16 |
| 5498500 | Overlay measurement mark and method of measuring an overlay error between multi patterns in a semiconductor device using the measurement mark | — | 1996-03-12 |