KF

Kenneth P. Fuchs

HA Hyundai Electronics America: 10 patents #5 of 148Top 4%
Lsi Logic: 8 patents #212 of 1,957Top 15%
AT AT&T: 4 patents #4,399 of 18,772Top 25%
Ncr: 1 patents #1,404 of 2,952Top 50%
SL Symbios Logic: 1 patents #28 of 87Top 35%
📍 Colorado Springs, CO: #125 of 2,971 inventorsTop 5%
🗺 Colorado: #1,934 of 40,980 inventorsTop 5%
Overall (All Time): #225,682 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
7176082 Analog capacitor in dual damascene process Todd A. Randazzo, John D. Walker 2007-02-13
7118985 Method of forming a metal-insulator-metal capacitor in an interconnect cavity Derryl D. J. Allman 2006-10-10
6822282 Analog capacitor in dual damascene process Todd A. Randazzo, John D. Walker 2004-11-23
6596579 Method of forming analog capacitor dual damascene process Todd A. Randazzo, John D. Walker 2003-07-22
6522005 Integrated circuit device comprising low dielectric constant material for reduced cross talk Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 2003-02-18
6522006 Low dielectric constant material in integrated circuit Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 2003-02-18
6504250 Integrated circuit device with reduced cross talk Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 2003-01-07
6504202 Interconnect-embedded metal-insulator-metal capacitor Derryl D. J. Allman 2003-01-07
6504249 Integrated circuit device with reduced cross talk Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 2003-01-07
6448653 Method for using low dielectric constant material in integrated circuit fabrication Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 2002-09-10
6358837 Method of electrically connecting and isolating components with vertical elements extending between interconnect layers in an integrated circuit Gayle W. Miller 2002-03-19
6208029 Integrated circuit device with reduced cross talk Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 2001-03-27
6071817 Isolation method utilizing a high pressure oxidation Derryl D. J. Allman 2000-06-06
6057571 High aspect ratio, metal-to-metal, linear capacitor for an integrated circuit Gayle W. Miller 2000-05-02
6010963 Global planarization using SOG and CMP Derryl D. J. Allman 2000-01-04
5543361 Process for forming titanium silicide local interconnect Steven S. Lee, Gayle W. Miller 1996-08-06
5447880 Method for forming an amorphous silicon programmable element Steven S. Lee, Gayle W. Miller 1995-09-05
5443996 Process for forming titanium silicide local interconnect Steven S. Lee, Gayle W. Miller 1995-08-22
5438022 Method for using low dielectric constant material in integrated circuit fabrication Derryl D. J. Allman, Gayle W. Miller, Samuel C. Gioia 1995-08-01
5312512 Global planarization using SOG and CMP Derryl D. J. Allman 1994-05-17