Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12255047 | Embedded high-z marker material and process for alignment of multilevel ebeam lithography | Christopher David Bohn, Maxwell Choi, Melanie S. Yajima, Maggy Lau, Clayton Jackson +2 more | 2025-03-18 |
| 11823864 | Embedded high-Z marker material and process for alignment of multilevel ebeam lithography | Christopher David Bohn, Maxwell Choi, Melanie S. Yajima, Maggy Lau, Clayton Jackson +2 more | 2023-11-21 |