Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4962171 | Blocked monomer and polymers therefrom for use as photoresists | Christopher E. Osuch | 1990-10-09 |
| 4912018 | High resolution photoresist based on imide containing polymers | Christopher E. Osuch | 1990-03-27 |
| 4902784 | 1,3 Disubstituted-5-diazobarbituric acids | Frederick R. Hopf | 1990-02-20 |
| 4857435 | Positive photoresist thermally stable compositions and elements having deep UV response with maleimide copolymer | Frederick R. Hopf, Christopher E. Osuch | 1989-08-15 |
| 4837124 | High resolution photoresist of imide containing polymers | Chengjiu Wu, Anne Mooring, Christopher E. Osuch, James T. Yardley | 1989-06-06 |
| 4810613 | Blocked monomer and polymers therefrom for use as photoresists | Christopher E. Osuch | 1989-03-07 |
| 4775609 | Image reversal | — | 1988-10-04 |
| 4735885 | Deep UV photoresist composition with 1,3-disubstituted-5-diazobarbituric acids | Frederick R. Hopf | 1988-04-05 |
| 4720445 | Copolymers from maleimide and aliphatic vinyl ethers and esters used in positive photoresist | Karime Brahim | 1988-01-19 |