KM

Ki-Yeung Mun

HC Hansol Chemical Co.: 2 patents #5 of 56Top 9%
📍 Daechang-ri, KR: #34 of 92 inventorsTop 40%
Overall (All Time): #1,726,599 of 4,157,543Top 45%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
12365700 Group 4 metal element-containing compound, precursor composition including same, and method for manufacturing thin film using same Hyun-Kee Kim, Cheol-Wan Park, Ee-Seul SHIN, Eun Jeong Cho, Jang-Hyeon Seok +1 more 2025-07-22
11472821 Precursor compounds for atomic layer deposition (ALD) and chemical vapor deposition (CVD) and ALD/CVD process using the same Jung Wun HWANG, Jun Won Lee, Kyu Hyun Yeom, Jang-Hyeon Seok, Jung-Woo Park 2022-10-18