NK

Norimasa Katakura

GC Globalwafers Co.: 1 patents #142 of 221Top 65%
📍 Sakado, JP: #108 of 173 inventorsTop 65%
Overall (All Time): #2,741,876 of 4,157,543Top 70%
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Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
11081359 Methods for polishing semiconductor substrates that adjust for pad-to-pad variance Ichiro Yoshimura, Alex Chu, H. J. Chiu, Sumeet S. Bhagavat, Taehyeong Kim +1 more 2021-08-03