Issued Patents All Time
Showing 26–50 of 54 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8247284 | Manufacture of semiconductor device with stress structure | — | 2012-08-21 |
| 8232180 | Manufacturing method of semiconductor device comprising active region divided by STI element isolation structure | — | 2012-07-31 |
| 8207042 | Semiconductor device and method of manufacturing the same | Yosuke Shimamune, Masahiro Fukuda, Young Suk Kim, Akira Katakami, Akiyoshi Hatada +1 more | 2012-06-26 |
| 8164085 | Semiconductor device and production method thereof | Yosuke Shimamune, Hiroyuki Ohta, Akiyoshi Hatada, Akira Katakami | 2012-04-24 |
| 8158498 | P-channel MOS transistor and fabrication process thereof | Masashi Shima, Yosuke Shimamune, Akiyoshi Hatada, Akira Katakami | 2012-04-17 |
| 8134189 | Semiconductor device and method of manufacturing the same | — | 2012-03-13 |
| 8071435 | Manufacture of semiconductor device with stress structure | — | 2011-12-06 |
| 7968414 | Semiconductor device and production method thereof | Hiroyuki Ohta, Takashi Sakuma, Yosuke Shimamune, Akiyoshi Hatada, Akira Katakami | 2011-06-28 |
| 7968920 | Semiconductor device and manufacturing method thereof | — | 2011-06-28 |
| 7875521 | Semiconductor device and production method thereof | Yosuke Shimamune, Hiroyuki Ohta, Akiyoshi Hatada, Akira Katakami | 2011-01-25 |
| 7821077 | Semiconductor device | — | 2010-10-26 |
| 7816766 | Semiconductor device with compressive and tensile stresses | Yosuke Shimamune, Akiyoshi Hatada, Akira Katakami, Masashi Shima | 2010-10-19 |
| 7791064 | Semiconductor device and fabrication method thereof | Yosuke Shimamune, Akira Katakami, Akiyoshi Hatada, Masashi Shima | 2010-09-07 |
| 7683362 | Semiconductor device and production method thereof | Hiroyuki Ohta, Takashi Sakuma, Yosuke Shimamune, Akiyoshi Hatada, Akira Katakami | 2010-03-23 |
| 7667227 | Semiconductor device and fabrication method thereof | Yosuke Shimamune, Akira Katakami, Akiyoshi Hatada, Masashi Shima | 2010-02-23 |
| 7649232 | P-channel MOS transistor, semiconductor integrated circuit device and fabrication process thereof | Kazuo Kawamura, Akira Katakami | 2010-01-19 |
| 7626215 | Semiconductor device and method of manufacturing the same | Yosuke Shimamune, Masahiro Fukuda, Young Suk Kim, Akira Katakami, Akiyoshi Hatada +1 more | 2009-12-01 |
| 7579617 | Semiconductor device and production method thereof | Yosuke Shimamune, Hiroyuki Ohta, Akiyoshi Hatada, Akira Katakami | 2009-08-25 |
| 7518188 | P-channel MOS transistor and fabrication process thereof | Masashi Shima, Yosuke Shimamune, Akiyoshi Hatada, Akira Katakami | 2009-04-14 |
| 7476941 | Semiconductor integrated circuit device and fabrication process thereof | Masashi Shima, Yosuke Shimamune, Akiyoshi Hatada, Akira Katakami | 2009-01-13 |
| 7432180 | Method of fabricating a nickel silicide layer by conducting a thermal annealing process in a silane gas | Yasunori Uchino, Kazuo Kawamura | 2008-10-07 |
| 7429525 | Fabrication process of a semiconductor device | Yasunori Uchino, Kazuo Kawamura | 2008-09-30 |
| 7378305 | Semiconductor integrated circuit and fabrication process thereof | Akiyoshi Hatada, Akira Katakami, Yosuke Shimamune, Masashi Shima, Hiroyuki Ohta | 2008-05-27 |
| 7361613 | Semiconductor device, manufacture and evaluation methods for semiconductor device, and process condition evaluation method | Mitsuaki Hori, Mayumi Shigeno | 2008-04-22 |
| 7262465 | P-channel MOS transistor and fabrication process thereof | Akiyoshi Hatada, Akira Katakami, Yosuke Shimamune, Masashi Shima | 2007-08-28 |