Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5770260 | Process for forming silicon dioxide film | Shun-ichi Fukuyama, Daitei Shin, Yuki Komatsu, Hideki Harada, Yoshihiro Nakata +1 more | 1998-06-23 |
| 5602060 | Process for the production of semiconductor devices | Syun-ichi Fukuyama, Yoshihiro Nakata, Masanori Naitou, Hiroshi Kudo, Yoshiyuki Ohkura | 1997-02-11 |