LW

Liqing Wen

FU Fujifilm Electronic Materials U.S.A.: 12 patents #14 of 77Top 20%
FS Fujifilm Planar Solutions: 2 patents #10 of 21Top 50%
📍 Mesa, AZ: #162 of 2,463 inventorsTop 7%
🗺 Arizona: #2,515 of 32,909 inventorsTop 8%
Overall (All Time): #334,232 of 4,157,543Top 9%
14
Patents All Time

Issued Patents All Time

Showing 1–14 of 14 patents

Patent #TitleCo-InventorsDate
12398291 Polishing compositions and methods of use thereof James McDonough, Ting-Kai Huang, Yannan Liang, Shu-Wei Chang, Sung Tsai Lin 2025-08-26
12371589 Polishing compositions and methods of use thereof Ting-Kai Huang, Tawei Lin, Bin Hu, Yannan Liang 2025-07-29
12319843 Polishing compositions and methods of using the same Qingmin Cheng, Bin Hu, Yannan Liang, Hyosang Lee, Yibin Zhang +1 more 2025-06-03
12024650 Polishing compositions and methods of using the same Qingmin Cheng, Bin Hu, Yannan Liang, Hyosang Lee, Yibin Zhang +1 more 2024-07-02
11999876 Bulk ruthenium chemical mechanical polishing composition David (Tawei) Lin, Bin Hu, Yannan Liang, Ting-Kai Huang 2024-06-04
11851585 Polishing compositions and methods of use thereof Ting-Kai Huang, Tawei Lin, Bin Hu, Yannan Liang 2023-12-26
11732157 Polishing compositions and methods of use thereof Yannan Liang, Bin Hu, Shu-Wei Chang 2023-08-22
11505718 Barrier ruthenium chemical mechanical polishing slurry David (Tawei) Lin, Bin Hu, Yannan Liang, Ting-Kai Huang 2022-11-22
11414568 Polishing compositions and methods of use thereof Ting-Kai Huang, Tawei Lin, Bin Hu, Yannan Liang 2022-08-16
11279850 Bulk ruthenium chemical mechanical polishing composition David (Tawei) Lin, Bin Hu, Yannan Liang, Ting-Kai Huang 2022-03-22
11034859 Barrier ruthenium chemical mechanical polishing slurry David (Tawei) Lin, Bin Hu, Yannan Liang, Ting-Kai Huang 2021-06-15
10676646 Chemical mechanical polishing slurry for cobalt applications Yannan Liang, Bin Hu, Hyosang Lee, Shu-Wei Chang, Sung Tsai Lin 2020-06-09
8779011 Ultrapure colloidal silica for use in chemical mechanical polishing applications Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert Moyaerts, Saeed H. Mohseni +2 more 2014-07-15
8211193 Ultrapure colloidal silica for use in chemical mechanical polishing applications Deepak Mahulikar, Yuhu Wang, Ken A. Delbridge, Gert Moyaerts, Saeed H. Mohseni +2 more 2012-07-03