ST

Syozo Takada

EB Ebara: 1 patents #1,014 of 1,611Top 65%
NI Nikon: 1 patents #1,647 of 2,493Top 70%
📍 Tsukuba, JP: #1,315 of 2,818 inventorsTop 50%
Overall (All Time): #2,094,761 of 4,157,543Top 55%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
8241426 CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device Hisanori Matsuo, Akira Ishikawa 2012-08-14
7384622 Zeolite nano-crystal suspension, zeolite nano-crystal production method, zeolite nano-crystal suspension production method, and zeolite thin film Nobuhiro Hata, Guoqing Guan, Takenobu Yoshino 2008-06-10