Issued Patents All Time
Showing 26–50 of 51 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7695995 | Image sensor and method of fabricating the same | — | 2010-04-13 |
| 7675101 | Image sensor and manufacturing method thereof | — | 2010-03-09 |
| 7655545 | Image sensor and method of fabricating the same | — | 2010-02-02 |
| 7582502 | Method for manufacturing back side illumination image sensor | Hee Sung Shim | 2009-09-01 |
| 7560330 | CMOS image sensor and method for manufacturing the same | — | 2009-07-14 |
| 7488616 | CMOS image sensor and method for manufacturing the same | — | 2009-02-10 |
| 7453110 | CMOS image sensor and method for manufacturing the same | — | 2008-11-18 |
| 7279354 | Microlens of CMOS image sensor and method of manufacturing the same | — | 2007-10-09 |
| 7268009 | Method for fabricating a CMOS image sensor | — | 2007-09-11 |
| 7227199 | Image sensor and method of manufacturing the same | — | 2007-06-05 |
| 6869817 | Image sensor and method of manufacturing the same | — | 2005-03-22 |
| 6063529 | Overlay accuracy measurement mark | — | 2000-05-16 |
| 5952134 | Method for measuring overlay accuracy | — | 1999-09-14 |
| 5837403 | Photomask for removing the notching phenomenon | — | 1998-11-17 |
| 5731109 | Pattern structure of photomask comprising a sawtooth pattern | — | 1998-03-24 |
| 5700700 | Transistor in a semiconductor device and method of making the same | — | 1997-12-23 |
| 5681771 | Method of manufacturing a LDD transistor in a semiconductor device | — | 1997-10-28 |
| 5665495 | Method for fabricating a semiconductor with a photomask | — | 1997-09-09 |
| 5616438 | Reticle and a method for measuring blind setting accuracy using the same | — | 1997-04-01 |
| 5578401 | Photomask for the measurement of resolution of exposure equipment | — | 1996-11-26 |
| 5563010 | Exposure mask | — | 1996-10-08 |
| 5557855 | Reticle | — | 1996-09-24 |
| 5552251 | Reticle and method for measuring rotation error of reticle by use of the reticle | — | 1996-09-03 |
| 5523184 | Photomask for forming high resolution photoresist patterns | Jae S. In | 1996-06-04 |
| 5516605 | Photo mask provided with development rate measuring pattern and method for measuring development rate uniformity | — | 1996-05-14 |