Issued Patents All Time
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5523184 | Photomask for forming high resolution photoresist patterns | Joon Hwang | 1996-06-04 |
| 5376482 | Photomask having alignment marks | Joon Hwang, Hyun Gon Lee, Hong Lae Kim, Young B. Yi | 1994-12-27 |