MR

Martin Roth

CI Ciba-Geigy: 41 patents #34 of 2,867Top 2%
VA Vantico: 5 patents #1 of 104Top 1%
CC Ciba Specialty Chemicals: 5 patents #233 of 1,233Top 20%
HA Huntsman Advanced Materials Americas: 5 patents #7 of 101Top 7%
WL Wista Laboratories: 2 patents #22 of 40Top 60%
SL Sierra Lobo: 2 patents #3 of 20Top 15%
TA The University Court Of The University Of Aberdeen: 2 patents #18 of 101Top 20%
GI Giba-Geigy: 1 patents #1 of 13Top 8%
OM Ocg Microelectronic Materials: 1 patents #21 of 42Top 50%
📍 Basel, OH: #1 of 1 inventorsTop 100%
Overall (All Time): #32,016 of 4,157,543Top 1%
67
Patents All Time

Issued Patents All Time

Showing 26–50 of 67 patents

Patent #TitleCo-InventorsDate
5554797 Tetra (hydroxphenyl) alkanes Reinhard Schulz, Norbert M unzel, Wilhelm Knobloch 1996-09-10
5523362 Oligomeric cyanoguanidines Peter Flury, Sameer H. Eldin 1996-06-04
5436098 Positive photoresists with enhanced resolution and reduced crystallization containing novel tetra(hydroxyphenyl)alkanes Reinhard Schulz, Norbert Munzel, Wilhelm Knobloch 1995-07-25
5432049 Photochromic composition Evelyn Fischer, Walter Fischer, Jurgen Finter, Kurt Meier 1995-07-11
5424373 Oligomeric cyanoguanidines hardeners for epoxy resins Peter Flury, Sameer H. Eldin 1995-06-13
5352831 Oligomeric cyanoguanidines Peter Flury, Sameer H. Eldin 1994-10-04
5310909 Photochromic compounds, a process for their preparation, and their use Evelyn Fischer, Walter Fischer, Jurgen Finter, Kurt Meier 1994-05-10
5300380 Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers Kurt Meier 1994-04-05
5296330 Positive photoresists containing quinone diazide photosensitizer, alkali-soluble resin and tetra(hydroxyphenyl) alkane additive Reinhard Schulz, Norbert Munzel, Wilhelm Knobloch 1994-03-22
5247113 Araliphatic sulfonium and their use Beat Muller 1993-09-21
5162547 Process for the preparation of glycidyl ethers Heinz Wolleb, Marc-Andre Truffer 1992-11-10
5149767 Thermosetting mixtures utilizing araliphatic sulfonium salts Kurt Munk 1992-09-22
5079129 Negative photoresist based on polyphenols and epoxy compounds or vinyl ethers Kurt Meier 1992-01-07
5013814 Araliphatic sulfonium salts and their use Beat Muller 1991-05-07
5001243 Substituted naphthacene-5, 12-diones Walter Fischer, Marcus Baumann, Jurgen Finter, Vratislav Kvita, Carl W. Mayer +1 more 1991-03-19
4994346 Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds Kurt Meier, Adrian Schulthess, Heinz Wolleb 1991-02-19
4962012 Process for producing photographic relief images using photopolymerizable compositions containing fluorinated titanocenes Martin Riediker, Niklaus Buhler, Joseph Berger 1990-10-09
4910121 Photopolymerizable composition containing metallocenes Martin Riediker, Niklaus Buhler, Joseph Berger 1990-03-20
4908423 Advanced epoxide resins based on cyclohex-1-ylmethylenediphenol derivatives or bicyclo[2.2.1]hept-1-ylmethylenediphenol derivatives Charles E. Monnier 1990-03-13
4888402 Copolymes formed from N-hydroxyphenylmaleinimide (derivatives) and allyl compounds Peter Flury, Sameer H. Eldin 1989-12-19
4855367 Orthocarbonates Peter Flury, Sameer H. Eldin, Claus W. Rabener 1989-08-08
4808740 So-called advanced epoxide resins based on cyclohex-1-ylmethylenediphenol derivatives or bicyclo(2.2.1)hept-1-ylmethylenediphenol derivatives Charles E. Monnier 1989-02-28
4806448 Cyclic acetals or ketals of 8-keto esters or amides 1989-02-21
4754003 Phenol ethers containing epoxide groups Charles E. Monnier 1988-06-28
4737426 Cyclic acetals or ketals of beta-keto esters or amides 1988-04-12