Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6475563 | Method for forming a thin film using a gas | Yukihiro Hayakawa, Kenji Makino, Yuzo Kataoka | 2002-11-05 |
| 6329265 | Method of making a semiconductor device using processing from both sides of a workpiece | Mamoru Miyawaki, Shunsuke Inoue, Yutaka Akino, Toru Koizumi, Tetsunobu Kohchi | 2001-12-11 |
| 6156657 | Method of treating active material | Hideshi Kuwabara, Tetsuo Asaba, Kenji Makino, Yuzo Kataoka, Yasuhiro Sekine +1 more | 2000-12-05 |
| 6143190 | Method of producing a through-hole, silicon substrate having a through-hole, device using such a substrate, method of producing an ink-jet print head, and ink-jet print head | Takayuki Yagi, Junichi Kobayashi, Genzo Momma, Kenji Makino, Kei Fujita +3 more | 2000-11-07 |
| 6004885 | Thin film formation on semiconductor wafer | Yukihiro Hayakawa, Kenji Makino, Yuzo Kataoka | 1999-12-21 |
| 5952694 | Semiconductor device made using processing from both sides of a workpiece | Mamoru Miyawaki, Shunsuke Inoue, Yutaka Akino, Toru Koizumi, Tetsunobu Kohchi | 1999-09-14 |
| 5776255 | Chemical vapor deposition apparatus | Tetsuo Asaba, Kazuaki Ohmi, Yasuhiro Sekine, Yukihiro Hayakawa | 1998-07-07 |
| 5580822 | Chemical vapor deposition method | Yukihiro Hayakawa, Kenji Makino, Yuzo Kataoka | 1996-12-03 |
| 5534069 | Method of treating active material | Hideshi Kuwabara, Tetsuo Asaba, Kenji Makino, Yuzo Kataoka, Yasuhiro Sekine +1 more | 1996-07-09 |
| 5476815 | Manufacturing method of semiconductor device | — | 1995-12-19 |
| 5447568 | Chemical vapor deposition method and apparatus making use of liquid starting material | Yukihiro Hayakawa, Kenji Makino, Yuzo Kataoka | 1995-09-05 |