Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8744526 | Communication terminal, and dial registration method and dial registration program therefor | Toshikazu Houmura, Kazuhiro Yoshihara, Kazuma Nagaoka | 2014-06-03 |
| 8588857 | Communication terminal, and dial registration method and dial registration program therefor | Toshikazu Houmura, Kazuhiro Yoshihara, Kazuma Nagaoka | 2013-11-19 |
| 8249229 | Communication terminal, and dial registration method and dial registration program therefor | Toshikazu Houmura, Kazuhiro Yoshihara, Kazuma Nagaoka | 2012-08-21 |
| 8068529 | Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array | Mitsuhiro Ikuta, Yasuhisa Inao | 2011-11-29 |
| 8019061 | Communication terminal, and dial registration method and dial registration program therefor | Toshikazu Houmura, Kazuhiro Yoshihara, Kazuma Nagaoka | 2011-09-13 |
| 7863061 | Surface emitting laser manufacturing method, surface emitting laser array manufacturing method, surface emitting laser, surface emitting laser array, and optical apparatus including surface emitting laser array | Mitsuhiro Ikuta, Yasuhisa Inao | 2011-01-04 |
| 7776509 | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | Toshiki Ito | 2010-08-17 |
| 7733491 | Sensor device and testing method utilizing localized plasmon resonance | Ryo Kuroda, Natsuhiko Mizutani, Yasuhisa Inao, Tomohiro Yamada | 2010-06-08 |
| 7704672 | Photosensitive silane coupling agent, method of modifying surface, method of forming pattern, and method of fabricating device | Toshiki Ito, Natsuhiko Mizutani, Yasuhisa Inao | 2010-04-27 |
| 7691540 | Exposure mask, method of designing and manufacturing the same, exposure method and apparatus, pattern forming method, and device manufacturing method | Yasuhisa Inao | 2010-04-06 |
| 7659039 | Near-field exposure mask, method of producing that mask, near-field exposure apparatus having that mask, and resist pattern forming method | Toshiki Ito, Natsuhiko Mizutani | 2010-02-09 |
| 7651834 | Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production | Toshiki Ito | 2010-01-26 |
| 7615332 | Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process | Toshiki Ito | 2009-11-10 |
| 7592108 | Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same | Ryo Kuroda | 2009-09-22 |
| 7547503 | Photosensitive silane coupling agent, method of forming pattern, and method of fabricating device | Toshiki Ito, Natsuhiko Mizutani, Yasuhisa Inao | 2009-06-16 |
| 7419763 | Near-field exposure photoresist and fine pattern forming method using the same | Ryo Kuroda | 2008-09-02 |
| 7399445 | Chemical sensor | Ryo Kuroda, Natsuhiko Mizutani, Yasuhisa Inao, Tomohiro Yamada | 2008-07-15 |
| 7303859 | Photoresist, photolithography method using the same, and method for producing photoresist | Yasuhisa Inao | 2007-12-04 |
| 7190438 | Near-field exposure apparatus and near-field exposure photomask | Ryo Kuroda | 2007-03-13 |
| 7136145 | Pattern-forming apparatus using a photomask | Ryo Kuroda | 2006-11-14 |
| 7022463 | Near-field exposure photoresist and fine pattern forming method using the same | Ryo Kuroda | 2006-04-04 |
| 6849391 | Photoresist, photolithography method using the same, and method for producing photoresist | Yasuhisa Inao | 2005-02-01 |
| 6785445 | Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probe | Ryo Kuroda, Yasuhisa Inao, Tomohiro Yamada | 2004-08-31 |
| 6720115 | Exposure method and exposure apparatus using near-field light and exposure mask | Yasuhisa Inao, Ryo Kuroda | 2004-04-13 |
| 6632593 | Pattern-forming method using photomask, and pattern-forming apparatus | Ryo Kuroda | 2003-10-14 |