Issued Patents All Time
Showing 26–50 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7144682 | Near-field exposure method | Yasuhisa Inao, Natsuhiko Mizutani | 2006-12-05 |
| 7136145 | Pattern-forming apparatus using a photomask | Takako Yamaguchi | 2006-11-14 |
| 7068353 | Exposure apparatus and method | Koji Yano, Kohei Okamoto | 2006-06-27 |
| 7022463 | Near-field exposure photoresist and fine pattern forming method using the same | Takako Yamaguchi | 2006-04-04 |
| 7001696 | Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device | Yasuhisa Inao | 2006-02-21 |
| 6982419 | Probe with hollow waveguide and method for producing the same | Yasuhiro Shimada | 2006-01-03 |
| 6891151 | Probe with hollow waveguide and method for producing the same | Yasuhiro Shimada | 2005-05-10 |
| 6785445 | Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probe | Takako Yamaguchi, Yasuhisa Inao, Tomohiro Yamada | 2004-08-31 |
| 6720115 | Exposure method and exposure apparatus using near-field light and exposure mask | Yasuhisa Inao, Takako Yamaguchi | 2004-04-13 |
| 6721040 | Exposure method and apparatus using near field light | Kenji Saito, Yasuhisa Inao | 2004-04-13 |
| 6640433 | Method for forming a micro-pattern | Hiroshi Matsuda, Kiyoshi Takimoto | 2003-11-04 |
| 6632593 | Pattern-forming method using photomask, and pattern-forming apparatus | Takako Yamaguchi | 2003-10-14 |
| 6628392 | Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof | Yasuhiro Shimada, Junichi Seki, Takako Yamaguchi, Yasuhisa Inao | 2003-09-30 |
| 6559926 | Pattern forming apparatus and pattern forming method | Takako Yamaguchi | 2003-05-06 |
| 6408123 | NEAR-FIELD OPTICAL PROBE HAVING SURFACE PLASMON POLARITON WAVEGUIDE AND METHOD OF PREPARING THE SAME AS WELL AS MICROSCOPE, RECORDING/REGENERATION APPARATUS AND MICRO-FABRICATION APPARATUS USING THE SAME | Yasuhiro Shimada, Takako Yamaguchi | 2002-06-18 |
| 6408122 | Probe for irradiating with or detecting light and method for manufacturing the same | Yasuhiro Shimada | 2002-06-18 |
| 6337477 | Probe having micro-projection and manufacturing method thereof | Yasuhiro Shimada, Takayuki Yagi | 2002-01-08 |
| 6335522 | Optical probe having a refractive index micro-lens and method of manufacturing the same | Yasuhiro Shimada, Takayuki Yagi, Takayuki Teshima | 2002-01-01 |
| 6333497 | Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe | Yasuhiro Shimada | 2001-12-25 |
| 6252238 | Micro-processing method using a probe | Koji Yano | 2001-06-26 |
| 6215114 | Optical probe for detecting or irradiating light and near-field optical microscope having such probe and manufacturing method of such probe | Takayuki Yagi, Tsutomu Ikeda, Yasuhiro Shimada | 2001-04-10 |
| 6201226 | Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe | Yasuhiro Shimada | 2001-03-13 |
| 6187482 | Mask for evanescent light exposure, object to be exposed and apparatus using same | Junji Ohyama | 2001-02-13 |
| 6171730 | Exposure method and exposure apparatus | Tsutomu Ikeda, Yasuhiro Shimada | 2001-01-09 |
| 6166386 | Micro-processing method using a probe | Koji Yano | 2000-12-26 |