Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9156125 | Polishing pad with light-stable light-transmitting region | — | 2015-10-13 |
| 8075372 | Polishing pad with microporous regions | — | 2011-12-13 |
| 7699684 | CMP porous pad with component-filled pores | — | 2010-04-20 |
| 7686994 | Method of preparing a conductive film | Ronald E. Myers | 2010-03-30 |
| 7435161 | Multi-layer polishing pad material for CMP | Michael S. Lacy | 2008-10-14 |
| 7435165 | Transparent microporous materials for CMP | — | 2008-10-14 |
| 7311862 | Method for manufacturing microporous CMP materials having controlled pore size | — | 2007-12-25 |
| 7267607 | Transparent microporous materials for CMP | — | 2007-09-11 |
| 7264641 | Polishing pad comprising biodegradable polymer | — | 2007-09-04 |
| 7204742 | Polishing pad comprising hydrophobic region and endpoint detection port | — | 2007-04-17 |
| 7195544 | CMP porous pad with component-filled pores | — | 2007-03-27 |
| 7059936 | Low surface energy CMP pad | — | 2006-06-13 |
| 6998166 | Polishing pad with oriented pore structure | — | 2006-02-14 |
| 6960120 | CMP pad with composite transparent window | — | 2005-11-01 |
| 6935931 | Microporous polishing pads | — | 2005-08-30 |
| 6913517 | Microporous polishing pads | — | 2005-07-05 |
| 6899598 | Microporous polishing pads | — | 2005-05-31 |
| 6896593 | Microporous polishing pads | — | 2005-05-24 |
| 6884156 | Multi-layer polishing pad material for CMP | Roland Sevilla, Michael S. Lacy | 2005-04-26 |