FZ

Feng Zhang

BO BOE: 105 patents #64 of 12,373Top 1%
BC Baoshan Iron & Steel Co.: 8 patents #12 of 423Top 3%
WC Wuhan China Star Optoelectronics Semiconductor Display Technology Co.: 4 patents #164 of 623Top 30%
BC Beijing Boe Technology Development Co.: 4 patents #146 of 1,775Top 9%
VS Valspar Sourcing: 3 patents #59 of 201Top 30%
YC Yungu (Gu'An) Technology Co.: 2 patents #75 of 252Top 30%
SC Shenzhen Tcl New Technology Co.: 2 patents #19 of 150Top 15%
Applied Materials: 1 patents #4,780 of 7,310Top 70%
NU Nanjing University: 1 patents #82 of 294Top 30%
HC Hefei Xinsheng Optoelectronics Technology Co.: 1 patents #643 of 1,065Top 65%
NT Nanjing University Of Technology: 1 patents #35 of 106Top 35%
NC Nio (Anhui) Holding Co.: 1 patents #12 of 52Top 25%
PT Promos Technologies: 1 patents #115 of 311Top 40%
PP Promos Technologies Pte.: 1 patents #13 of 24Top 55%
TS The Sherwin-Williams: 1 patents #225 of 458Top 50%
📍 Shandong, CA: #1 of 53 inventorsTop 2%
Overall (All Time): #6,073 of 4,157,543Top 1%
151
Patents All Time

Issued Patents All Time

Showing 151–151 of 151 patents

Patent #TitleCo-InventorsDate
7241538 Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same Limin Lou 2007-07-10