Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7241538 | Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of same | Feng Zhang | 2007-07-10 |