Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12146125 | Use of compositions comprising a solvent mixture for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below | Daniel LOEFFLER, Yeni Burk, Frank Oliver Heinrich Pirrung, Lothar Alexander Engelbrecht, Szilard Csihony +3 more | 2024-11-19 |
| 11970647 | Composition, its use and a process for selectively etching silicon-germanium material | Francisco Javier Lopez Villanueva, Yeni Burk, Daniel LOEFFLER, Jan Ole Mueller, Patrick Wilke +2 more | 2024-04-30 |
| 11180719 | Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below | Daniel LOEFFLER, Mei Chin SHEN, Sheng-Hsuan Wei, Frank Oliver Heinrich Pirrung, Lothar Alexander Engelbrecht +3 more | 2021-11-23 |