Issued Patents All Time
Showing 26–37 of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5075199 | Radiation sensitive mixture and production of relief patterns | Reinhold Schwalm | 1991-12-24 |
| 5073474 | Radiation-sensitive mixture containing acid labile groups and production of relief patterns | Reinhold Schwalm, Andreas Boettcher | 1991-12-17 |
| 5069997 | Positive and negative working radiation sensitive mixtures and production of relief patterns | Reinhold Schwalm | 1991-12-03 |
| 5069998 | Radiation sensitive mixture and production of relief patterns | Reinhold Schwalm, Andreas Boettcher, Martin Fischer | 1991-12-03 |
| 5039595 | Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists | Reinhold Schwalm | 1991-08-13 |
| 5034305 | Radiation-sensitive mixture | Son Nguyen-Kim, Gerhard Hoffmann, Reinhold Schwalm | 1991-07-23 |
| 4913949 | Planar, multilayered, laser-optical recording material | Helmut Steininger | 1990-04-03 |
| 4883740 | Radiation-sensitive mixture for photosensitive coating materials | Reinhold Schwalm, Andreas Boettcher | 1989-11-28 |
| 4822866 | Copolymers having O-nitrocarbinol ester groups and production of semiconductor components | Reinhold Schwalm | 1989-04-18 |
| 4812542 | Copolymers having o-nitrocarbinol ester groups and preparation thereof | Reinhold Schwalm | 1989-03-14 |
| 4808682 | Copolymers having o-nitrocarbinol ester groups, production of two-layer resists, and fabrication of semiconductor components | Reinhold Schwalm | 1989-02-28 |
| 4757098 | Stabilized solutions of radiation-crosslinkable polymer precursors of highly heat-resistant polymers | Hans-Joachim Merrem, Rudolf Klug | 1988-07-12 |